
I mainly work in the Microfabrication Clean Room (MCR) in the CII using standard CMOS processes such as silicon dioxide deposition using plasma enhanced chemical vapor deposition, photolithography, reactive ion etching, sputtering of metal films, and chemical-mechanical polishing.
p>Our goal is to fabricate four layer copper “woodpile” photonic crystal structures with micron sized features. The thermal radiation of this structure will be matched to absorption wavelengths of GaInSb based detectors for applications in thermal photovoltaics for power generation.
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